High-absorptance high-emittance anodic coating
LE HUONG GIANG (US)
CHESTERFIELD JOHN L (US)
MC DONNELL DOUGLAS CORP (US)
ALUMINUM FINISHING CORP (US)
- Priority:1996/03/18
- Grant:1999/09/07
LE HUONG GIANG (US)
CHESTERFIELD JOHN L (US)
MC DONNELL DOUGLAS CORP (US)
ALUMINUM FINISHING CORP (US)
- US-5820740-A
- US-5948542-A
F24J2/40 (inventive)
C25D11/16
B64G1/52 (inventive)
B64G1/50 (inventive)
C25D11/12 (inventive)
C25D11/14 (inventive)
C25D11/24
B64G1/22 (inventive)
C25D11/14 (inventive)
C25D11/12 (inventive)
B64G1/226 (inventive)
Y02E10/40
B64G1/52 (inventive)
C25D11/16
F24S50/80 (inventive)
B64G1/50 (inventive, first)
C25D11/246
- JP-S56166396-A (SEA)
- US-4310586-A (SEA)
- US-4397716-A (SEA)
- US-4511614-A (SEA)
- US-4647347-A (SEA)
- US-4648911-A (SEA)
- US-4904353-A (SEA)
- US-5035949-A (SEA)
- US-5217600-A (SEA)
- US-5296285-A (SEA)
- US-5401573-A (SEA)
- US-5472788-A (SEA)
- US-5478415-A (SEA)
- Sealing of Electrolytically Formed Porous Films of Aluminum by Nickel Fluoride Process, Kalantary et al., Plat. Sur. Finish , (1993), 80(12), pp. 52 56. (SEA)
- Sealing of Electrolytically Formed Porous Films of Aluminum by Nickel Fluoride Process, Kalantary et al., Plat. Sur. Finish, (1993), 80(12), pp. 52-56. (UNKNOWN)
- US-6297550-B1 (SEA)
- WO-2004063405-A2 (A) (ISR)
- WO-2004063405-A3 (A) (ISR)
- US-2005031856-A1 (PRS)
- US-6866945-B2 (SEA)
- WO-2015076802-A1 (A) (ISR)
- Google PatentsLICENSE"Google Patents Research Data" by Google, based on data provided by IFI CLAIMS Patent Services and OntoChem, is licensed under a Creative Commons Attribution 4.0 International License.https://creativecommons.org/licenses/by/4.0/legalcode
- PubChem